Imec welcomes the world’s most advanced High NA EUV system in its 300mm cleanroom, marking the start of the ångström era

Today, imec announced the arrival of the ASML EXE:5200, the world’s most advanced High NA EUV lithography system, in its 300mm cleanroom in Leuven.

The tool will be directly connected to imec’s ecosystem of state-of-the-art patterning and metrology equipment, enabling accelerated learning cycles for patterning the next-generation semiconductor technologies. This capability is essential for developing beyond-2nm logic and future high-density memory, supporting rapidly growing AI and high-performance computing (HPC) markets.

The installation is a major milestone within imec’s strategic partnership with ASML and is supported by the EU Chips Joint Undertaking, IPCEI, and the Flemish and Dutch governments.

“As an integral part of the EU funded NanoIC pilot line, the tool is set to play a pivotal role in strengthening Europe’s position as a leader in advanced semiconductor R&D in the decades to come.” – Luc Van den hove, imec.

Read the full press release to find out more about this new High NA EUV system and its significance for advanced semiconductor R&D