Workshop on Fundamentals and Advances of MOVPE Processes at imec

This fourth edition (FAME IV) continues a series of deep-dive workshops dedicated to exploring the challenges, open questions, and emerging opportunities in epitaxy. A carefully selected group of leading experts – recognized for their outstanding contributions to the scientific community – will deliver invited presentations and share their extensive expertise.

With NanoIC’s support, the workshop – previously accessible only to a select, invited group – has been expanded to welcome the wider European scientific community. Scientists and PhD students can participate free of charge, offering a unique opportunity to engage directly with world-class experts in a highly interactive and collaborative environment.

The workshop aims to connect European researchers investigating both fundamental and advanced aspects of MOVPE and related epitaxial techniques, including CVD, MBE, and ALD. These approaches will be discussed across a wide range of material systems, such as III-V and group-IV semiconductors, 2D materials, and oxides. Emphasis will be placed on understanding the fundamental mechanisms – addressing why certain processes are possible and identifying remaining unknowns – rather than focusing solely on record-setting device performance. This perspective is intended to encourage in-depth discussions, critical thinking, and knowledge exchange on growth mechanisms, characterization methods, theoretical understanding, and unresolved challenges.

Participants are encouraged to take advantage of this unique opportunity to engage directly with leading specialists in their field. The program will include a dedicated poster session, allowing attendees to present their own challenges, questions, and ongoing research in line with the workshop’s interactive and exploratory spirit. The focused workshop size ensures excellent networking opportunities and meaningful scientific exchange. 

Registration & practicalities

When: June 10, 2026 (~12:00 start) – June 12, 2026 (end ~13:00). Detailed schedule will be available in May. 
Where: imec HQ, Leuven, Belgium

How to attend? Students, scientists, and engineers with a solid background in epitaxy are warmly encouraged to contribute with a poster. To apply, please submit your poster title, author list, and an abstract (maximum 300 words) to the following e-mail address: FAMEIV@imec.be

Abstract submission deadline: April 30, 2026
Notification of acceptance: May 8, 2026 

The distribution of workshop places will be based on abstract submission for the purpose of strengthening the scientific exchange within the European research community. If there is space available, participation without abstract submission will also be possible.  

If you would like to attend without an abstract submission, please send your request also to this e-mail to: FAMEIV@imec.be

Once your application is accepted, you will receive information about registration.

How to reach imec HQ? https://www.imec-int.com/en/connect-with-us/imec-belgium
Looking for an accommodation? Accommodation summary | Visit Leuven

Workshop scientific committee: Rachel Oliver (Univ. Cambridge), Peter Parbrook (Tyndall), Michael Jetter (Univ. Stuttgart), Erik Bakkers (TU/e), Emanuele Pelucchi (Tyndall), Christophe Durand (CEA), Bernardette Kunert (imec)  

Join us for this inspiring workshop and become part of a dynamic scientific community advancing the fundamental understanding and future of epitaxial growth. 

Invited speakers

Frank Holsteyn (imec, Belgium)
Intoduction to NanoIC

Kerstin Volz (Marburg University, Germany)
Interfaces and phases in MOCVD-grown post-transition-metal chalcogenides

Rachel Oliver (University of Camridge, UK)
Controlling formation of single photon emitting colour centres in MOVPE of gallium nitride

Moritz Brehm (JK University of Linz, Austria)
Epitaxy of group-IV materials by LT-MBE

Henry Medina Silva (imec, Belgium)
Towards Single-Crystalline TMDC Films: Epitaxial Control, and Quantitative Characterization Metrics

Jens Ohlmann (Fraunhofer ISE, Germany)
Cost-Effective MOVPE for III-V Photovoltaics

Yves Mols (imec, Belgium)
Challenges in III-V growth on engineered substrates

Roberto Bergamaschini (University of Milano-Bicocca, Italy)
Modelling and simulation of crystal growth at the continuum scale: thermodynamics vs. kinetics

Christophe Durand (University Grenoble Alpes, CEA, France)
Growth dynamic of facets in nitride nano-structures

Qiang Li (Cardiff University, UK)
III–V Epitaxy on SOI: Novel MOVPE Approaches for Future Silicon Photonics

Andreas Popp (Leibniz Institute for Crystal Growth (IKZ), Germany)
The Challenge of Homoepitaxial growth of β-Ga2O3 by MOVPE

Giordano Scappucci (Delft University of Technology, The Netherlands)
Epitaxial germanium and silicon for quantum technologies

Patrick Parkinson (University of Manchester, UK)
Data-Driven Recipes: Bayesian Optimization and Machine Learning for Low-Variance Microring Lasers

Kimberly Dick Thelander (Lund University, Sweden)
Dynamics of semiconductor nanocrystal growth explored by in situ TEM of CVD processes

Dan Lamb (Swansea University, UK)
Managing Dual H₂ and O₂ Chemistries for Oxide and Chalcogenide Growth in CCS MOCVD

Matthew Charles (CEA-LETI, France)
Diffusion effects in selective area GaN growth

Stephan Hofmann (University of Cambridge, UK)
Closed-loop Growth Discovery for Monolayer Materials

Elisa M. Sala (University of Sheffield, UK)
Exploring the MOVPE growth of Droplet Epitaxy telecom InAs/InP Quantum Dots for Quantum Photonic Applications

Elizaveta Semenova (Technical University of Denmark, Denmark)
Engineering Site-Controlled Quantum Dots at Telecom Wavelengths

Detlev Grützmacher (Jülich Research Centre, Germany)
Advancements in traditional and novel growth methodologies